- ...circuitry
- This is often called mixed analog-digital design.
- ...a
- 8#8 denotes the standard deviation of parameters.
Accepting parts within 7#7 of the target parameter
will maximise the yield of the processing[WE92].
- ...resistors
- A unit resistor is a resistor of a
specific geometry. The unit resistor has resistance 13#13, and
any multiples of this value may be realised using a (natural) number of
unit resistors.
- ...gives
- 0.1dB corresponds to 1.16%:
20#20
- ...variations
- The term local
implies that the region affected by the variation is `small'. Typically ,
the affected area is less than 9#9.
- ...used
- See
[O'L91]. The data have been compiled for a 31#1 CMOS process.
Note that such data are process dependent, but the above guidelines may be
used in the absence of more precise data.
- ...processing
- Anisotropic processing, i.e. the processing speed
differs with the crystal orientation, is the rule rather than
the exception for small geometry processes.
- ...layout
- The first moment of area is equal for
the components which are matched.
- ...possible
- Any process gradient may be approximated
by the Taylor series in a small region around the origin. If the
region is small, the approximation holds the best.
- ...ADC
- The resistor was not laid out using
common centroid techniques, but still demonstrated worst case
matching better than 0.2%. We believe that the errors due to
contact impedance in a common centroid layout structure would
have been comparable.
- ...areas
- The differences in field oxide thicknesses
drawn in Figure 2.10 are deliberately exaggerated
to underline the effect.
- ...by
- 55#55 denotes the
sheet resistance of the resistor.
- ...impedance
- In a typical 57#57 CMOS process, the well is
58#58's deep. If the side diffusion is approximately
70%, the area of curvature is roughly 59#59 long. The
doping concentration in the area of curvature is lower than
in the rest of the well area.
- ...N+
- First, the effect
of the curvature on resistance value is eliminated by avoiding
the corners. Second, extending the well sufficiently means that
N+ is not over the area of curvature even in case of misalignment.
- ...dependence
- Transistors, resistors etc. Almost any parameter
shows temperature dependence.
- ...saturated
- The small-signal equivalent diagram
is formed by observing the changes in the currents caused by small
changes in the terminal voltages (VGS, VBS and VDS).
- ...complicated
- A thorough analysis
of the problem may be found in [Tsi93].
- ...VGS-VT
- Note that for values of VGS-VT below 50-100mV, the
transistor operates in the subthreshold region,
and the usual expressions for the channel current no longer
hold.
- ...1V
- The dotted curves show
what happens to the current, when the expression no longer holds.
- ...required
- E.g. modem front ends.
- ...process
- For a
P-Well process, the VDD must be common external to the
circuit. For twin-well processes, the doping of the substrate
must be carefully considered.
- ...supplies
- A double bond is often desired for supplies.
If a pad has already got a double bond, then a third bond is
usually not permitted.
- ...is
- Equation 6.2 can be used with relatively little
error for almost all printed circuit board connections.
- ...nodes
- E.g. the output nodes of an operational
transconductance amplifier (OTA), or the compensation node of
an internally compensated operational amplifier.
- ...capacitor
- In a double poly-layer process.
- ...lines
- The recommendation is for an N-well process.
- ...switches
- This
is often called clock feedthru.
Flemming Stassen (assoc. professor)
Wed Jan 21 13:35:14 MET 1998