| Dimensions of various structures | [ Å ] | |
|---|---|---|
| Thickness of passivation | 9000 | |
| Thickness of metal6 and metal5 | tm6, tm5 | 9200 |
|
Thickness of metal4, metal3, metal2, and metal1 |
tm4, tm3, tm2, tm1 | 5000 |
| Thickness of poly | tpo | 2000 |
|
Thickness of isolation oxides: metal6-to-metal5, metal5-to-metal4, metal4-to-metal3, metal3-to-metal2, metal2-to-metal1 |
to65, to54, to43, to32, to21 | 7000 |
| Thickness of metal1-to-poly oxide | to1p | 9700 |
| Field oxide (metal1-to-active) thickness | tFmox | 12000 |
| Field oxide (poly-to-substrate) thickness | tFpox | 3700 |
| Gate oxide thickness | tox | 32 |
| Note: The process uses planarization techniques | ||